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dc.provenanceCONICET-
dc.creatorKumar, K.-
dc.creatorArun, P.-
dc.creatorKant, C.-
dc.creatorMehra, N.-
dc.creatorMakinistian, Leonardo-
dc.creatorAlbanesi, Eduardo Aldo-
dc.date2017-02-24T13:28:55Z-
dc.date2017-02-24T13:28:55Z-
dc.date2010-10-
dc.date2017-02-17T13:27:14Z-
dc.date.accessioned2019-04-29T15:41:23Z-
dc.date.available2019-04-29T15:41:23Z-
dc.date.issued2017-02-24T13:28:55Z-
dc.date.issued2017-02-24T13:28:55Z-
dc.date.issued2010-10-
dc.date.issued2017-02-17T13:27:14Z-
dc.identifierKumar, K.; Arun, P.; Kant, C.; Mehra, N.; Makinistian, Leonardo; et al.; Effect of residual stress on the optical properties of CsCl thin films; Elsevier; Journal Of Physics And Chemistry Of Solids; 71; 3; 10-2010; 163-169-
dc.identifier0022-3697-
dc.identifierhttp://hdl.handle.net/11336/13348-
dc.identifier.urihttp://rodna.bn.gov.ar:8080/jspui/handle/bnmm/299594-
dc.descriptionLarge band gap alkali halides are known to have interesting optical properties. Though expected to betransparent in nature, defects in the crystal structure results in alkali halides having colors. The defectsgives rise to new energy levels in the band structure, called color centers. Defects are easily generatedon film fabrication and hence study of alkali halides promise to be interesting. In this manuscript wereport the optical properties of cesium chloride (CsCl) thin films. We have correlated the opticalproperties of the films with the lattice size of the polycrystalline films, thus highlighting the strongrelationship between the structure and optical properties of alkali halide films.-
dc.descriptionFil: Kumar, K.. University of Delhi; India-
dc.descriptionFil: Arun, P.. University of Delhi; India-
dc.descriptionFil: Kant, C.. Guru Gobind Singh Indraprastha University; India-
dc.descriptionFil: Mehra, N.. University of Delhi; India-
dc.descriptionFil: Makinistian, Leonardo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química (i); Argentina. Universidad Nacional de Entre Ríos. Facultad de Ingeniería; Argentina-
dc.descriptionFil: Albanesi, Eduardo Aldo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química (i); Argentina. Universidad Nacional de Entre Ríos. Facultad de Ingeniería; Argentina-
dc.formatapplication/pdf-
dc.formatapplication/pdf-
dc.languageeng-
dc.publisherElsevier-
dc.relationinfo:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1016/j.jpcs.2009.10.013-
dc.relationinfo:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0022369709002984-
dc.rightsinfo:eu-repo/semantics/restrictedAccess-
dc.rightshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/-
dc.sourcereponame:CONICET Digital (CONICET)-
dc.sourceinstname:Consejo Nacional de Investigaciones Científicas y Técnicas-
dc.sourceinstacron:CONICET-
dc.source.urihttp://hdl.handle.net/11336/63135-
dc.subjectA. Thinfilms-
dc.subjectC. X-raydiffraction-
dc.subjectÓptica-
dc.subjectCiencias Físicas-
dc.subjectCIENCIAS NATURALES Y EXACTAS-
dc.titleEffect of residual stress on the optical properties of CsCl thin films-
dc.typeinfo:eu-repo/semantics/article-
dc.typeinfo:eu-repo/semantics/publishedVersion-
dc.typeinfo:ar-repo/semantics/articulo-
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